X-Ray Diffraction

 High Temperature X-Ray Diffraction

High temperature X-Ray diffraction (HTXRD) plays an important role in the study of
structural changes at hight temperatures, thermal behaviour, crystallization processes and
thermal expansion/contraction of matter. HTXRD is usually carried out with a X-Ray
diffractometer equipped with a high temperature attachment in which the temperature of
the sample is set to particular value and the X-Ray diffraction pattern is recorded at that
temperature. It is thus static temperature X-Ray Diffraction. In this way, a large number
of X-Ray diffraction patterns is required to cover a partucular temperature range, usually
room temperature to 1500K. The main disadvantage of this static temperature X-Ray
diffraction method is that a continuous trace of X-Ray Diffraction as a function of temp-
erature, which possesses enormous potential to disclose minute structural details, is not
conceiveable.

Some years ago, we have modified the Guinier De Lenne camera to record X-Ray diff-
raction pattern as a function of temperature on a continuously moving film, naming this
method as Dynamic Temperature X-Ray Diffraction (DTXD) in contrast to static tempe-
rature X-Ray diffraction. The continuity of X-Ray diffraction pattern as a function of temp-
erature reveals details which are unaccessible by static method. For details see e.g.

                             crystallization of glassy materials 

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